基于天然高分子的可再生光刻材料及其光刻机理的研究进展

Research progress of renewable lithography material based on natural polymer and its lithography mechanism

摘要:

基于天然高分子的新型光刻材料与石油原料的传统光刻材料相比，不仅保留了高分辨率的光刻性能，还具有绿色可再生和无毒显影等优点。本文综述了天然高分子光刻材料中的蛋白类光刻材料和多糖类光刻材料，系统的总结了各种天然高分子光刻材料的优缺点。通过对不同材料光刻机理的深入研究，得出蛋白质光刻材料的光刻机理主要依靠辐射改变蛋白结构，使其溶解度在显影液中发生改变实现光刻；而天然多糖类光刻材料则主要依赖引入光响应基团实现光刻。最后本文对基于天然高分子的可再生光刻材料的现存问题进行了分析并对发展前景做出了展望。

Abstract:

Compared with the traditional lithography materials of petroleum raw materials, the new lithography materials based on natural polymers not only retain high-resolution lithography performance, but also have the advantages of renewable and non-toxic development. The classification, advantages and disadvantages of protein lithography materials and polysaccharide lithography materials in natural polymer lithography materials are systematically summarized in this article. Through in-depth research on the lithography mechanism of different materials, it is concluded that the lithography mechanism of protein lithography materials mainly relies on radiation to change the structure of the protein, so that its solubility changes in the developer to achieve lithography; and the natural polysaccharide lithography materials mainly rely on the introduction of photo-responsive groups to achieve lithography. Finally, the existing problems and development prospects of renewable lithography materials based on natural polymers are analyzed in this article.