异质结Ag/NiO/g-C3N4的制备及其光催化降解土霉素

Photocatalytic Degradation of Oxytetracycline by NiO/Ag/g-C3N4 S-Scheme Heterojunction via Photo-Fenton synergism

摘要:

本实验采用浸渍法和光还原法将 NiO 和 Ag 负载在 g-C3N4 表面,合成三元复合 材料 NiO/Ag/g-C3N4,对复合材料进行 X-射线衍射(XRD) 、红外光谱(FT-IR) 、荧光光谱(PL)等表征。使用该催化材料在光-Fenton 催化体系下对土霉素进行降解。实验结果表明,相比纯的 g-C3N4、NiO 、以及 NiO/g-C3N4,复合后的异质结光催化剂对土霉素的降解具有更高效的催化效果。当 pH=6 时,20 mg 20%-NiO/Ag/g-C3N4,在可见光作用下(λ>420 nm),120 min 对土霉素的降解率可达 89.3%。羟基自由基(?OH)和超氧基自由基(?O2-)在光-Fenton 催化降解中发挥了主要作用。

Abstract:

In this experiment, NiO/Ag/g-C3N4? ternary composites were synthesized by loading NiO andAg onto the g-C3N4? surface using impregnation and photoreduction methods. The composites were characterized by XRD, FT-IR and PL, etc. The catalytic activity of photocatalyst was? evaluated by the degradation? of oxytetracycline under photo-Fenton?? catalysis.??? The??? experimental?? results??? showed??? that?? the??? composite heterojunction photocatalyst had more efficient catalytic effect on the degradation of oxytetracycline? compared? to? pure? g-C3N4,? NiO,? and? NiO/g-C3N4.? When? 20? mg? of 20%-NiO/Ag/g-C3N4???? was??? added??? at?? pH=6,??? the??? photocatalytic?? degradation??? of oxytetracycline under visible light (λ>420 nm) for 120 min was 89.3%. The hydroxyl radical ( ?OH) and the superoxide radical ( ?O2-) played a major influence in photo-Fenton catalyzed degradation.